Theoretical bulk acoustic wave properties of (103) AlN films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 6 A, 2007, Pages 3471-3474

  Wu, Sean ^a   Lin, Zhi Xun ^b   Lee, Maw Shung ^b   Ro, Ruyen ^c  

^a TUNG FANG INSTITUTE OF TECHNOLOGY   (Taiwan)

^b NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^c I SHOU UNIVERSITY   (Taiwan)

Author keywords

(103) oriented; Aln; Quasi fast shear mode

Indexed keywords

ACOUSTIC WAVES; ALUMINUM COMPOUNDS; PIEZOELECTRIC MATERIALS;

PIEZOELECTRIC COUPLING CONSTANT; QUASI FAST SHEAR MODE;

METALLIC FILMS;

EID: 34547828837     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.3471     Document Type: Article

References (24)

1. K. M. Lakin, J. S. Wang, G. R. Kline, A. R. Landin, Y. Y. Chen, and J. D. Hunt: IEEE Ultrasonics Symp., 1982, p. 466.
2. K. M. Lakin, G. R. Kline, R. S. Ketcham, A. R. Landin, W. A. Burkland, K. T. McCarron, S. D. Braymen, and S. G. Burns: IEEE 41st Annu. Symp. Frequency Control, 1987, p. 371.
3. K. M. Lakin, G. R. Kline, R. S. Ketcham, J. T. Martin, and K. T. McCarron: IEEE Proc. 43rd Annu. Symp. Frequency Control, 1989, p. 536.
4. R. Jakkaraju, G. Henn, C. Shearer, M. Harris, N. Rimmer, and P. Rich: Microelectron. Eng. 70 (2003) 566.
5. T. Nishihara, T. Yokoyama, T. Miyashita, and Y. Satoh: Proc. IEEE Ultrasonics Symp., 2002, Vol. 1, p. 969.
6. M. Ishihara, S. J. Li, H. Yumoto, K. Akashi, and Y. Ide: Thin Solid Films 316 (1998) 152.
7. M.-A. Dubois and P. Murait: Appl. Phys. Lett. 74 (1999) 3032.
8. F. Martin, P. Murait, M.-A. Dubois, and A. Pezous: J. Vac. Sci. Technol. A 22 (2004) 361.
9. M.-A. Dubois and P. Muralt: J. Appl. Phys. 89 (2001) 6389.
10. R. Lanz and P. Murait: IEEE Trans. Ultrason. Ferroelectr. Freq. Control 52 (2005) 938.
11. H. P. Lobl, M. Klee, R. Milsom, R. Dekker, C. Metzmacher, W. Brand, and P. Lok: J. Eur. Ceram. Soc. 21 (2001) 2633.
12. V. Mortet, M. Nesladek, J. M'Dhaen, G. Vanhoyland, O. Elmazria, M. B. Assouar, P. Alnot, and M. B. D'Olieslaeger: Phys. Status Solidi A 193 (2001) 482.
13. H. Zhang and E. S. Kim,: J. Microelectromech. Syst. 14 (2005) 699.
14. D. S. Ballantine, R. M. White, S. J. Martin, A. J. Ricco, E. T. Zellers, G. C. Frye, and H. Wohltjen: Acoustic Wave Sensors; Theory, Design, and Physico-chemical Applications: (Academic Press, New York, 1996).
15. S. M. Reddy, J. P. Jones, and T. J. L. Lewis: J. Appl. Phys. 83 (1998) 2524.
16. L. McKenna, M. I. Newton, G. McHale, R. Lucklum, and J. Schroeder: J. Appl. Phys. 89 (2001.) 676.
17. G. Kovacs and A. Venema: Appl. Phys. Lett. 61 (1992) 639.
18. G. Wingqvist, J. Bjurstrom, L. Liljeholm, I. Katardjiev, and A. Lloyd Spetz: IEEE Sens. J. 5 (2005) 4.
19. J. Bjurstrom, G. Wingqvist, and I. Katardjiev: Proc. IEEE Ultrasonics Symp., 2005, Vol. 1, p. 321.
20. F. S. Hickernell: Proc. IEEE Ultrasonics Symp., 1996, Vol. 1, p. 235.
21. J. F Rosenbaum: Bulk Acoustic Wave Theory and Devices (Artech House, Boston, London, 1998).
22. J. G. Gualtieri, J. A. Kosinski, and A. Ballato: IEEE Trans. Ultrason. Ferroelectr. Freq. Control 41 (1994) 53.
23. Q. Chen, T. Shun, and Q.-M. Wang: Proc. IEEE Int. Frequency Control Symp. Expos., 2004, p. 11.
24. K. M. Lakin: Proc. IEEE Ultrasonics Symp., 1999, Vol. 2, p. 895.