Surface reconstruction and elastic behavior of silicon nanobeams: The impact of applied deformation

Thin Solid Films

Volumn 518, Issue 12, 2010, Pages 3273-3275

  Sadeghian, Hamed ^a,b   Goosen, Johannes F L ^b   Bossche, Andre ^a   Thijsse, Barend J ^a   van Keulen, Fred ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Elastic behavior; Modified embedded atom method; Molecular dynamics; Nanostructures; Reconstruction

Indexed keywords

APPLIED STRAIN; ELASTIC BEHAVIOR; ELASTIC RESPONSE; MODIFIED EMBEDDED ATOM METHODS; MOLECULAR DYNAMICS CALCULATION; NANOPLATES; RECONSTRUCTION; ROOM TEMPERATURE; SILICON (100); SURFACE REGION; UNIAXIAL TENSILE STRAIN;

ATOMS; MOLECULAR DYNAMICS; NANOWIRES; TENSILE STRAIN;

SURFACE RECONSTRUCTION;

EID: 77649234343     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.01.013     Document Type: Letter

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