Sputter erosion of Si(0 0 1) using a new silicon MEAM potential and different thermostats

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 255, Issue 1 SPEC. ISS., 2007, Pages 195-201

  Timonova, Maria ^a   Lee, Beyong Joo ^b   Thijsse, Barend J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

MEAM; Molecular dynamics; Potential; Silicon; Sputtering

Indexed keywords

ARGON; COMPUTER SIMULATION; MOLECULAR DYNAMICS; PARAMETER ESTIMATION; THERMAL DIFFUSION; THERMOSTATS;

MEAM PARAMATRIZATION; SILICON MODELING; STILLINGER-WEBER POTENTIAL;

SILICON;

EID: 33846922740     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.11.023     Document Type: Article

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