메뉴 건너뛰기




Volumn 3, Issue 2, 2010, Pages

Order of reaction between photoresist and atomic hydrogen generated by a tungsten hot-wire catalyst

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC HYDROGEN; ATOMIC HYDROGEN DENSITY; FIRST ORDER KINETICS; HYDROGEN MOLECULE; ORDER OF REACTION; PHOTORESIST REMOVAL; REACTION ORDERS;

EID: 76949102649     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.3.026501     Document Type: Article
Times cited : (33)

References (19)
  • 4
    • 76949092904 scopus 로고    scopus 로고
    • J. I. Pankove and N. M. Johnson: in Hydrogen in Semiconductors, ed. R. K. Willardson and A. C. Beer (Academic Press, San Diego, CA, 1991) Semiconductors and Semimetals, 34, p. 110.
    • J. I. Pankove and N. M. Johnson: in Hydrogen in Semiconductors, ed. R. K. Willardson and A. C. Beer (Academic Press, San Diego, CA, 1991) Semiconductors and Semimetals, Vol. 34, p. 110.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.