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Journal of Applied Physics

Volumn 107, Issue 3, 2010, Pages

Growth and characterization of In-polar and N-polar InAlN by metal organic chemical vapor deposition

(6) Brown, David F a Keller, Stacia a Mates, Thomas E a Speck, James S a Denbaars, Steven P a Mishra, Umesh K a

a University of California (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GROWTH CONDITIONS; METALORGANIC CHEMICAL VAPOR DEPOSITION; MISORIENTATION ANGLE; MOLE FRACTION; POLAR LAYERS; POLAR ORIENTATION; SMOOTH SURFACE; STEP BUNCHING; VICINAL SAPPHIRE;

GALLIUM NITRIDE; INDIUM; INDUSTRIAL CHEMICALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; ORGANIC CHEMICALS; ORGANOMETALLICS; SUPERSATURATION; SURFACE MORPHOLOGY;

GALLIUM ALLOYS;

EID: 76949096475 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3296127 Document Type: Article

Times cited : (30)

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