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Applied Physics A: Materials Science and Processing

Volumn 98, Issue 3, 2010, Pages 571-581

Optical properties of one-dimensional photonic crystals fabricated by photo-electrochemical etching of silicon

(6) Astrova, E V a Tolmachev, V A a Fedulova, G V a Melnikov, V A b Ankudinov, A V a Perova, T S b

a IOFFE INSTITUTE (Russian Federation)

b TRINITY COLLEGE DUBLIN (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION TECHNIQUE; FTIR; IN-PLANE; INFRA RED; INTERFACE ROUGHNESS; INTERFERENCE FRINGE; LATTICE PERIODS; MICRO SPECTROSCOPY; MICRO-PHOTONICS; MIDINFRARED; NEAR-IR; ONE DIMENSIONAL PHOTONIC CRYSTAL; OPTICAL REFLECTION; PHOTO-ELECTROCHEMICAL ETCHING; PHOTONIC STRUCTURE; REFLECTION SPECTRA; SI SUBSTRATES; SIDE WALLS; TRENCH DEPTH; WIDE SPECTRAL RANGE;

ELECTROCHEMICAL ETCHING; ELECTROCHEMICAL PROPERTIES; FABRICATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTODEGRADATION; PHOTONIC CRYSTALS; REFLECTION;

OPTICAL PROPERTIES;

EID: 76749121290 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-009-5469-7 Document Type: Article

Times cited : (18)

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