Bandgap tuning of silicon micromachined 1-D photonic crystals by thermal oxidation

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 14, Issue 4, 2008, Pages 1074-1081

  Barillaro, Giuseppe ^a   Merlo, Sabina ^b   Strambini, Lucanos Marsilio ^a  

^a UNIVERSITY OF PISA   (Italy)

^b UNIVERSITY OF PAVIA   (Italy)

Author keywords

Micromachining; Optical components; Optical device fabrication; Optical reflection; Photonic bandgap materials; Silicon

Indexed keywords

ASPECT RATIO; CHEMICAL OXYGEN DEMAND; CRYSTAL ATOMIC STRUCTURE; CRYSTALLOGRAPHY; CRYSTALS; ENERGY GAP; NONMETALS; OPTICAL DESIGN; OPTICAL TESTING; OXIDATION; PHOTONICS; POWDERS; REFLECTION; SILICA; TUNING;

AIR GAPS; BAND-GAP TUNING; BAND-GAPS; ELECTROCHEMICAL MICRO-MACHINING; ETCHING DEPTH; FABRICATED DEVICES; FABRICATION PROCESSES; HIGH ASPECT RATIOS; MICROMACHINED; MICROMACHINING; NEAR-IR; OPTICAL COMPONENTS; OPTICAL DEVICE FABRICATION; OPTICAL REFLECTION; OPTICAL-; PHOTONIC BAND-GAPS; PHOTONIC BANDGAP MATERIALS; QUARTER-WAVELENGTH; SILICON; SILICON DIOXIDES; SILICON STRUCTURES; SILICON WALLS; WAVELENGTH POSITIONS; WAVELENGTH RANGES;

PHOTONIC CRYSTALS;

EID: 48949084132     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSTQE.2008.916183     Document Type: Article

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