Electron and ion kinetics in magnetized capacitively coupled plasma source

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 3, 2007, Pages 455-463

  Lee, S H ^a   You, S J ^a,b   Chang, H Y ^a,b   Lee, J K ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON ENERGY LEVELS; ION SOURCES; MAGNETIC FIELD EFFECTS; MAGNETIZATION; MONTE CARLO METHODS;

COUPLED PLASMA REACTOR; GYROMOTION; ION ENERGY DISTRIBUTION FUNCTION (IEDF); PROBABILITY FUNCTION;

PLASMA SOURCES;

EID: 34047131286     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2713408     Document Type: Article

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