Electron energy distribution function in capacitively coupled RF discharges: Difference between electropositive Ar and electronegative SiH4 discharges

Plasma Sources Science and Technology

Volumn 9, Issue 4, 2000, Pages 583-591

  Yan, M ^a   Bogaerts, A ^a   Goedheer, W J ^b   Gijbels, R ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRIC FIELDS; ELECTRONS; MATHEMATICAL MODELS; MONTE CARLO METHODS; PLASMA SHEATHS; SILANES;

ELECTRON ENERGY DISTRIBUTION FUNCTION (EEDF); ELECTRONEGATIVE DISCHARGES; ELECTROPOSITIVE DISCHARGES;

GLOW DISCHARGES;

EID: 0034322892     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/9/4/314     Document Type: Article

References (26)

1. Godyak V A and Piejak R B 1990 Phys. Rev. Lett. 65 996
2. Godyak V A, Piejak R B and Alexandovich B M 1992 Phys. Rev. Lett. 68 40
3. Godyak V A and Piejak R B 1993 Appl. Phys. Lett. 63 3137
4. Surendra M and Graves D B 1991 Phys. Rev. Lett. 66 1469
5. Vahedi V, DiPeso G, Birdsall C K, Lieberman M A and Rognlien T D 1993 Plasma Sources Sci. Technol. 2 273
6. Busch C and Kortshagen U 1995 Phys. Rev. E 51 280
7. Berezhnoi S V, Kaganovich I D and Tsendin L D 1998 Plasma Sources Sci. Technol. 7 268
8. Capitelli M, Gorse C, Winkler R and Wilhelm J 1988 Plasma Chem. Plasma Process. 8 399
9. Kushner M J 1986 IEEE Trans. Plasma Sci. 14 188
10. Yan M and Goedheer W J 1999 Plasma Sources Sci. Technol. 8 349
11. Yan M and Goedheer W J 1999 IEEE Trans. Plasma Sci. 27 1399
12. Curtins H, Wyrsch N, Favre M and Shah A V 1987 Plasma Chem. Plasma Process. 7 267
13. Gogolides E and Sawin H H 1992 J. Appl. Phys. 72 3971
14. Gogolides E, Nicolai J P and Sawin H. 1989 J. Vac. Sci. Technol. A 7 1001
15. Park A K and Economou D J 1990 J. Appl. Phys. 68 3904
16. Lymberopoulos D P and Economou D J 1995 J. Phys. D: Appl. Phys. 28 727
17. Yan M, Bogaerts A, Goedheer W J and Gijbels R J. Appl. Phys. 87 3628
18. Birdsall C K 1991 IEEE Trans. Plasma Sci. 19 65
19. Vahedi V and Surendra M 1995 Comput. Phys. Commun. 87 179
20. Birdsall C K, Kawamura E and Vahedi V 1998 NATO ASI Series B 367 57
21. Surendra M, Graves D B and Jellum G M 1990 Phys. Rev. A 41 1112
22. Hamers E 1998 Plasma deposition of hydrogenated amorphous silicon PhD Thesis Utrecht University, The Netherlands
23. Raizer Yu P, Shneider M N and Yatsenko N A 1995 Raido-Frequency Capacitive Discharges (Boca Raton, FL: CRC Press)
24. Turner M M and Hopkins M B 1992 Phys. Rev. Lett. 69 3511
25. Winkler R, Capitelli M, Dilonardo M, Gorse C and Wilhelm J 1986 Plasma Chem. Plasma Process. 6 437
26. Kolobov V I and Godyak V A 1995 IEEE Trans. Plasma Sci. 23 503