Improved growth behaviors and electrical properties of SrTiO3 thin films using the optimized seed layer deposited by atomic layer deposition

ECS Transactions

Volumn 19, Issue 2, 2009, Pages 685-698

  Lee, Sang Woon ^a   Han, Jeong Hwan ^a   Hwang, Cheol Seong ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CRYSTALLINITY; DIELECTRIC MATERIALS; ELECTRIC FIELDS; LEAKAGE CURRENTS; LOW-K DIELECTRIC; NITRIDES; SCHOTTKY BARRIER DIODES; SILICA; SILICON NITRIDE; STRONTIUM TITANATES; TITANIUM COMPOUNDS;

ANNEALING TEMPERATURES; CONDUCTION MECHANISM; ELECTRICAL CONDUCTION; ELECTRICAL PERFORMANCE; HIGH DIELECTRIC CONSTANTS; HIGH ELECTRIC FIELDS; LOW-LEAKAGE CURRENT; SCHOTTKY BARRIER HEIGHTS;

THIN FILMS;

EID: 76549116162     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3122124     Document Type: Conference Paper

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