Modeling of gas-phase and surface reactions in liquid-source chemical-vapor deposition of (Ba,Sr)TiO3 films

Journal of Applied Physics

Volumn 86, Issue 2, 1999, Pages 1082-1089

  Yamamuka, Mikio ^a   Kawahara, Takaaki ^a   Tarutani, Masayoshi ^a   Horikawa, Tsuyoshi ^a   Oomori, Tatsuo ^a   Ono, Kouichi ^a,b  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001309927     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370850     Document Type: Article

References (16)

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