Grain size refinement of the diamond film deposited on the WC-Co cutting inserts using direct current biasing

Surface and Coatings Technology

Volumn 171, Issue 1-3, 2003, Pages 1-5

  Park, Jong Keuk ^a   Lee, Wook Seong ^a   Baik, Young Joon ^a  

^a Korea Institute of Science and Technology   (South Korea)

Author keywords

DC bias; Diamond film; Edge; Grain size refinement; WC Co insert

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; GRAIN SIZE AND SHAPE; MACHINING;

DIRECT CURRENT (DC) BIASING;

DIAMOND FILMS;

CUTTING TOOL; DIAMOND; FILM; GRAIN; SIZE;

EID: 0038580433     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00226-3     Document Type: Article

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