Effect of ion bombardment on the properties of B4C thin films deposited by RF sputtering

Thin Solid Films

Volumn 355, Issue , 1999, Pages 210-213

  Lousa, A ^a   Martinez E ^a   Esteve, J ^a   Pascual, E ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

BORON CARBIDE; ELASTIC MODULI; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROHARDNESS; RESIDUAL STRESSES; SINTERING; SPUTTER DEPOSITION; STOICHIOMETRY; SUBSTRATES; THERMODYNAMIC STABILITY; THIN FILMS;

BEAM BENDING METHOD; DYNAMICAL NANOINDENTATION METHOD; MICROSCRATCH METHOD;

CERAMIC COATINGS;

EID: 0343953387     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00506-4     Document Type: Article

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