Low grain size TiN thin films obtained by low energy ion beam assisted deposition

Applied Surface Science

Volumn 173, Issue 3-4, 2001, Pages 290-295

  Lopez J M ^a   Gordillo Vazquez F J ^b   Bohme O ^b   Albella, J M ^a  

^a UNIVERSIDAD PERUANA CAYETANO HEREDIA   (Peru)

^b INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; EVAPORATION; GRAIN SIZE AND SHAPE; ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; NITROGEN; SILICON WAFERS; STOICHIOMETRY; SURFACE CHEMISTRY; SURFACE ROUGHNESS; THIN FILMS; WEAR OF MATERIALS;

WEAR IMPROVEMENT;

TITANIUM NITRIDE;

EID: 0342854159     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00912-0     Document Type: Article

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