Preparation, characterization and scanned conductance microscopy studies of DNA-templated one-dimensional copper nanostructures

Langmuir

Volumn 26, Issue 3, 2010, Pages 2068-2075

  Watson, Scott M D ^a   Wright, Nicholas G ^a   Horrocks, Benjamin R ^a   Houlton, Andrew ^a  

^a NEWCASTLE UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ASCORBIC ACIDS; CHEMICAL IDENTITY; DIRECT METAL DEPOSITION; DNA MOLECULES; DNA-TEMPLATE; ELECTRICAL PROPERTY; ELECTRICAL RESISTANCES; LATERAL DIMENSION; METAL NANOSTRUCTURE; METALLIC NANOWIRES; NANOSTRUCTURED CU; TEMPLATED; TUNNELING BARRIER;

ATOMIC FORCE MICROSCOPY; DNA; ELECTRIC PROPERTIES; ELECTRON ENERGY LOSS SPECTROSCOPY; GENES; KETONES; MORPHOLOGY; NANOWIRES; ORGANIC ACIDS;

X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER; DNA; METAL NANOPARTICLE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTRIC CONDUCTIVITY; IMPEDANCE; MICROSCOPY; OXIDATION REDUCTION REACTION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER; DNA; ELECTRIC CONDUCTIVITY; ELECTRIC IMPEDANCE; METAL NANOPARTICLES; MICROSCOPY; MICROSCOPY, ATOMIC FORCE; OXIDATION-REDUCTION; PHOTOELECTRON SPECTROSCOPY; X-RAY DIFFRACTION;

EID: 75749101814     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la902583j     Document Type: Article

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