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Journal of the Electrochemical Society

Volumn 157, Issue 2, 2010, Pages

High catalytic activity of palladium for metal-enhanced HF etching of silicon

(5) Yae, Shinji a Tashiro, Masayuki a Abe, Makoto a Fukumuro, Naoki a Matsuda, Hitoshi a

a UNIVERSITY OF HYOGO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYTIC ACTIVITY; DARK CONDITIONS; ELECTROLESS METHODS; ETCHING REACTION; HF ETCHING; HF SOLUTIONS; HIGH ACTIVITY; HYDROGEN EVOLUTION; INJECTED ELECTRONS; OXIDIZATION; OXIDIZING AGENTS; PD FILM; PD PARTICLE; POROUS LAYERS; POROUS SI;

DISSOLUTION; DISSOLVED OXYGEN; ELECTRON MOBILITY; ETCHING; HYDROFLUORIC ACID; HYDROGEN PEROXIDE; METAL IONS; METALS; OXIDATION; POROUS SILICON; WATER INJECTION;

PALLADIUM;

EID: 73849127001 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3264643 Document Type: Article

Times cited : (30)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.