Palladium-promoted oxidation of Si at low temperatures

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 590-594

  Kobayashi, H ^a   Kawa, H ^a   Yuasa, T ^a   Nakato, Y ^a   Yoneda, K ^b  

^a OSAKA UNIVERSITY   (Japan)

^b PANASONIC CORPORATION   (Japan)

Author keywords

Oxidation; Oxygen atom; Palladium; Silicon; Silicon oxide; XPS

Indexed keywords

ATOMS; CAPACITANCE; DEPOSITION; ELECTRIC VARIABLES MEASUREMENT; HEAT TREATMENT; OXIDES; OXYGEN; PALLADIUM; SEMICONDUCTING SILICON; SURFACES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

PALLADIUM PROMOTED OXIDATION; SILICON OXIDE;

OXIDATION;

EID: 0031547183     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00779-9     Document Type: Article

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