Hydrogen silsesquioxane double patterning process for 12 nm resolution x-ray zone plates

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2606-2611

  Chao, Weilun ^a   Kim, Jihoon ^b   Rekawa, Senajith ^a   Fischer, Peter ^a   Anderson, Erik ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT ALGORITHMS; DOUBLE PATTERNING; FABRICATION PROCESS; FINITE BEAMS; FRESNEL ZONE PLATE LENS; FULL-FIELD; GOLD SURFACES; HIGH RESOLUTION RESISTS; HYDROGEN SILSESQUIOXANE; NM RESOLUTION; PATTERN DENSITY; SHORT WAVELENGTHS; SINGLE EXPOSURE; SOFT X-RAY; SPATIAL RESOLUTION; SUB PIXELS; SURFACE CONDITIONING; TRIMETHOXYSILANE; ZONE PLATES;

ELECTRON BEAM LITHOGRAPHY; FABRICATION; GOLD; IMAGE RESOLUTION; OPTICAL INSTRUMENTS; X RAY DIFFRACTION;

PLATES (STRUCTURAL COMPONENTS);

EID: 72849122090     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3242694     Document Type: Conference Paper

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