Sub-pixel alignment for direct-write electron beam lithography

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 74-79

  Anderson, E H ^a   Ha, D ^a,b   Liddle, J A ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Alignment; Autocorrelation; Electron beam lithography

Indexed keywords

ALGORITHMS; ASPECT RATIO; BACKSCATTERING; DIFFRACTIVE OPTICS; FAST FOURIER TRANSFORMS; GOLD; INTERPOLATION; NANOTECHNOLOGY; NICKEL; POLYNOMIALS; SCANNING ELECTRON MICROSCOPY; SIGNAL TO NOISE RATIO;

ALIGNMENT MARKS; AUTOCORRELATION; ELECTRON SIGNALS;

ELECTRON BEAM LITHOGRAPHY;

EID: 18544401212     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00076-0     Document Type: Conference Paper

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