-
1
-
-
54249133947
-
-
0031-8965,. 10.1002/pssa.200778910
-
M. Ito, M. Kon, C. Miyazaki, N. Ikeda, M. Ishizaki, R. Matsubara, Y. Ugajin, and N. Sekine, Phys. Status Solidi A 0031-8965 205, 1885 (2008). 10.1002/pssa.200778910
-
(2008)
Phys. Status Solidi A
, vol.205
, pp. 1885
-
-
Ito, M.1
Kon, M.2
Miyazaki, C.3
Ikeda, N.4
Ishizaki, M.5
Matsubara, R.6
Ugajin, Y.7
Sekine, N.8
-
2
-
-
0035818983
-
Plastic transistors in active-matrix displays
-
DOI 10.1038/414599a
-
H. E. A. Huitema, G. H. Gelinck, J. B. P. H. van der Putten, K. E. Kuijk, C. M. Hart, E. Cantatore, P. T. Herwig, A. J. J. M. van Breemen, and D. M. de Leeuw, Nature (London) 0028-0836 414, 599 (2001). 10.1038/414599a (Pubitemid 33151246)
-
(2001)
Nature
, vol.414
, Issue.6864
, pp. 599
-
-
Huitema, H.E.A.1
Gelinck, G.H.2
Van Der Putten, J.B.P.H.3
Kuijk, K.E.4
Hart, C.M.5
Cantatore, E.6
Herwig, P.T.7
Van Breemen, A.J.J.M.8
De Leeuw, D.M.9
-
3
-
-
58149145296
-
-
0003-6951,. 10.1063/1.3054167
-
W. Lim, E. A. Douglas, S. H. Kim, D. P. Norton, S. J. Pearton, F. Ren, H. Shen, and W. H. Chang, Appl. Phys. Lett. 0003-6951 93, 252103 (2008). 10.1063/1.3054167
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 252103
-
-
Lim, W.1
Douglas, E.A.2
Kim, S.H.3
Norton, D.P.4
Pearton, S.J.5
Ren, F.6
Shen, H.7
Chang, W.H.8
-
4
-
-
56849108223
-
-
0003-6951,. 10.1063/1.3030873
-
R. Martins, P. Barquinha, L. Pereira, N. Correia, G. Goncalves, I. Ferreira, and E. Fortunato, Appl. Phys. Lett. 0003-6951 93, 203501 (2008). 10.1063/1.3030873
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 203501
-
-
Martins, R.1
Barquinha, P.2
Pereira, L.3
Correia, N.4
Goncalves, G.5
Ferreira, I.6
Fortunato, E.7
-
5
-
-
2342566983
-
-
0003-6951,. 10.1063/1.1690870
-
F. Eder, H. Klauk, M. Halik, U. Zschieschang, G. Schmid, and C. Dehm, Appl. Phys. Lett. 0003-6951 84, 2673 (2004). 10.1063/1.1690870
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 2673
-
-
Eder, F.1
Klauk, H.2
Halik, M.3
Zschieschang, U.4
Schmid, G.5
Dehm, C.6
-
6
-
-
5044247506
-
-
0741-3106,. 10.1109/LED.2004.836502
-
Y. H. Kim, D. G. Moon, and J. I. Han, IEEE Electron Device Lett. 0741-3106 25, 702 (2004). 10.1109/LED.2004.836502
-
(2004)
IEEE Electron Device Lett.
, vol.25
, pp. 702
-
-
Kim, Y.H.1
Moon, D.G.2
Han, J.I.3
-
7
-
-
60749103290
-
-
0003-6951,. 10.1063/1.3086394
-
W. Lim, E. A. Douglas, S. H. Kim, D. P. Norton, S. J. Pearton, F. Ren, H. Shen, and W. H. Chang, Appl. Phys. Lett. 0003-6951 94, 072103 (2009). 10.1063/1.3086394
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 072103
-
-
Lim, W.1
Douglas, E.A.2
Kim, S.H.3
Norton, D.P.4
Pearton, S.J.5
Ren, F.6
Shen, H.7
Chang, W.H.8
-
8
-
-
50649121902
-
-
0741-3106,. 10.1109/LED.2008.2001549
-
E. Fortunato, N. Correia, P. Barquinha, L. Pereira, G. Goncalves, and R. Martins, IEEE Electron Device Lett. 0741-3106 29, 988 (2008). 10.1109/LED.2008.2001549
-
(2008)
IEEE Electron Device Lett.
, vol.29
, pp. 988
-
-
Fortunato, E.1
Correia, N.2
Barquinha, P.3
Pereira, L.4
Goncalves, G.5
Martins, R.6
-
9
-
-
33751086142
-
7 gate insulator- for low voltage ZnO thin film transistors
-
DOI 10.1063/1.2387985
-
M. -H. Lim, K. T. Kang, and H. -G. Kim, Appl. Phys. Lett. 0003-6951 89, 202908 (2006). 10.1063/1.2387985 (Pubitemid 44772497)
-
(2006)
Applied Physics Letters
, vol.89
, Issue.20
, pp. 202908
-
-
Lim, M.-H.1
Kang, K.2
Kim, H.-G.3
Kim, I.-D.4
Choi, Y.5
Tuller, H.L.6
-
10
-
-
64349105658
-
-
0003-6951,. 10.1063/1.3118575
-
J. B. Kim, C. Fuentes-Hernandez, W. J. Postcavage, Jr., X. -H. Zhang, and B. Kippelen, Appl. Phys. Lett. 0003-6951 94, 142107 (2009). 10.1063/1.3118575
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 142107
-
-
Kim, J.B.1
Fuentes-Hernandez, C.2
Postcavage Jr., W.J.3
Zhang, X.-H.4
Kippelen, B.5
-
11
-
-
47549114330
-
-
0935-9648,. 10.1002/adma.200701069
-
J. H. Cho, J. Lee, Y. He, B. S. Kim, T. P. Lodge, and C. D. Frisbie, Adv. Mater. 0935-9648 20, 686 (2008). 10.1002/adma.200701069
-
(2008)
Adv. Mater.
, vol.20
, pp. 686
-
-
Cho, J.H.1
Lee, J.2
He, Y.3
Kim, B.S.4
Lodge, T.P.5
Frisbie, C.D.6
-
12
-
-
54949089244
-
-
0935-9648,. 10.1002/adma.200800617
-
M. J. Panzer and C. D. Frisbie, Adv. Mater. 0935-9648 20, 3177 (2008). 10.1002/adma.200800617
-
(2008)
Adv. Mater.
, vol.20
, pp. 3177
-
-
Panzer, M.J.1
Frisbie, C.D.2
-
13
-
-
7244254578
-
Low-voltage organic transistors with an amorphous molecular gate dielectric
-
DOI 10.1038/nature02987
-
M. Halik, H. Klauk, U. Zschieschang, G. Schmid, C. Dehm, M. Schutz, S. Maisch, F. Effenberger, M. Brunnbauer, and F. Stellaccl, Nature (London) 0028-0836 431, 963 (2004). 10.1038/nature02987 (Pubitemid 39434413)
-
(2004)
Nature
, vol.431
, Issue.7011
, pp. 963-966
-
-
Halik, M.1
Klauk, H.2
Zschieschang, U.3
Schmid, G.4
Dehm, C.5
Schutz, M.6
Malsch, S.7
Effenberger, F.8
Brunnbauer, M.9
Stellacci, F.10
-
14
-
-
84988044894
-
-
1476-1122,. 10.1038/nmat2291
-
J. H. Cho, J. Lee, Y. Xia, B. Kim, Y. He, M. J. Renn, T. P. Lodge, and C. D. Frisbie, Nature Mater. 1476-1122 7, 900 (2008). 10.1038/nmat2291
-
(2008)
Nature Mater.
, vol.7
, pp. 900
-
-
Cho, J.H.1
Lee, J.2
Xia, Y.3
Kim, B.4
He, Y.5
Renn, M.J.6
Lodge, T.P.7
Frisbie, C.D.8
-
15
-
-
70350041590
-
-
0003-6951,. 10.1063/1.3251782
-
J. Jiang, Q. Wan, J. Sun, and A. Lu, Appl. Phys. Lett. 0003-6951 95, 152114 (2009). 10.1063/1.3251782
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 152114
-
-
Jiang, J.1
Wan, Q.2
Sun, J.3
Lu, A.4
-
16
-
-
24344441213
-
Gate oxide induced switch-on undershoot current observed in thin-film transistors
-
DOI 10.1063/1.1954896, 253504
-
F. Yan, P. Migliorato, Y. Hong, V. Rana, R. Ishihara, Y. Hiroshima, D. Abe, S. Inoue, and T. Shimoda, Appl. Phys. Lett. 0003-6951 86, 253504 (2005). 10.1063/1.1954896 (Pubitemid 41244103)
-
(2005)
Applied Physics Letters
, vol.86
, Issue.25
, pp. 1-3
-
-
Yan, F.1
Migliorato, P.2
Hong, Y.3
Rana, V.4
Ishihara, R.5
Hiroshima, Y.6
Abe, D.7
Inoue, S.8
Shimoda, T.9
-
17
-
-
0030960642
-
2 thin films
-
DOI 10.1038/386587a0
-
K. Vanheusden, W. L. Warren, R. A. B. Devine, D. M. Fleetwood, J. R. Schwank, M. R. Shaneyfelt, P. S. Winokur, and Z. J. Lemnios, Nature (London) 0028-0836 386, 587 (1997). 10.1038/386587a0 (Pubitemid 27175420)
-
(1997)
Nature
, vol.386
, Issue.6625
, pp. 587-589
-
-
Vanheusden, K.1
Warren, W.L.2
Devine, R.A.B.3
Fleetwood, D.M.4
Schwank, J.R.5
Shaneyfelt, M.R.6
Winokur, P.S.7
Lemnios, Z.J.8
-
18
-
-
84955022033
-
-
0734-2101,. 10.1116/1.576885
-
J. A. Theil, D. V. Tsu, M. W. Watkins, S. S. Kim, and G. Lucovsky, J. Vac. Sci. Technol. A 0734-2101 8, 1374 (1990). 10.1116/1.576885
-
(1990)
J. Vac. Sci. Technol. A
, vol.8
, pp. 1374
-
-
Theil, J.A.1
Tsu, D.V.2
Watkins, M.W.3
Kim, S.S.4
Lucovsky, G.5
-
20
-
-
33750079023
-
Proton diffusion mechanism in amorphous SiO2
-
DOI 10.1103/PhysRevLett.97.155901
-
J. Godet and A. Pasquarello, Phys. Rev. Lett. 0031-9007 97, 155901 (2006). 10.1103/PhysRevLett.97.155901 (Pubitemid 44574349)
-
(2006)
Physical Review Letters
, vol.97
, Issue.15
, pp. 155901
-
-
Godet, J.1
Pasquarello, A.2
-
21
-
-
0019242095
-
-
0018-9499,. 10.1109/TNS.1980.4331084
-
F. B. McLean, IEEE Trans. Nucl. Sci. 0018-9499 27, 1651 (1980). 10.1109/TNS.1980.4331084
-
(1980)
IEEE Trans. Nucl. Sci.
, vol.27
, pp. 1651
-
-
McLean, F.B.1
-
22
-
-
9744248669
-
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
-
DOI 10.1038/nature03090
-
K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, Nature (London) 0028-0836 432, 488 (2004). 10.1038/nature03090 (Pubitemid 39585210)
-
(2004)
Nature
, vol.432
, Issue.7016
, pp. 488-492
-
-
Nomura, K.1
Ohta, H.2
Takagi, A.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
23
-
-
2942609361
-
-
0021-8979,. 10.1063/1.1712015
-
R. L. Hoffman, J. Appl. Phys. 0021-8979 95, 5813 (2004). 10.1063/1.1712015
-
(2004)
J. Appl. Phys.
, vol.95
, pp. 5813
-
-
Hoffman, R.L.1
-
24
-
-
67649184909
-
-
1932-7447,. 10.1021/jp901426e
-
J. Lee, L. G. Kaake, J. H. Cho, X. -Y. Zhu, T. P. Lodge, and C. D. Frisbie, J. Phys. Chem. C 1932-7447 113, 8972 (2009). 10.1021/jp901426e
-
(2009)
J. Phys. Chem. C
, vol.113
, pp. 8972
-
-
Lee, J.1
Kaake, L.G.2
Cho, J.H.3
Zhu, X.-Y.4
Lodge, T.P.5
Frisbie, C.D.6
|