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Volumn 82, Issue 5, 2008, Pages 476-481

Micro-hardness, microstructures and thermal stability of (Ti,Cr,Al,Si)N films deposited by cathodic arc method

Author keywords

(Ti,Cr,Al,Si)N; Cutting tools; PVD; Thermal stability; Thin films

Indexed keywords

CATHODES; CHROMIUM ALLOYS; CUTTING TOOLS; ELECTRIC ARCS; MICROHARDNESS; MICROSTRUCTURE; PHYSICAL VAPOR DEPOSITION; THERMODYNAMIC STABILITY; TITANIUM ALLOYS;

EID: 37049028118     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2007.07.048     Document Type: Article
Times cited : (38)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.