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Volumn 82, Issue 5, 2008, Pages 476-481
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Micro-hardness, microstructures and thermal stability of (Ti,Cr,Al,Si)N films deposited by cathodic arc method
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Author keywords
(Ti,Cr,Al,Si)N; Cutting tools; PVD; Thermal stability; Thin films
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Indexed keywords
CATHODES;
CHROMIUM ALLOYS;
CUTTING TOOLS;
ELECTRIC ARCS;
MICROHARDNESS;
MICROSTRUCTURE;
PHYSICAL VAPOR DEPOSITION;
THERMODYNAMIC STABILITY;
TITANIUM ALLOYS;
ANNEALING TEMPERATURE;
CATHODIC ARC METHOD;
PHASE SEGREGATION;
TICRALSI ALLOY CATHODES;
THIN FILMS;
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EID: 37049028118
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2007.07.048 Document Type: Article |
Times cited : (38)
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References (18)
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