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Volumn 202, Issue 22-23, 2008, Pages 5400-5404
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Effect of cathode arc current and bias voltage on the mechanical properties of CrAlSiN thin films
a
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Author keywords
Cathodic arc plasma deposition system; CrAlSiN films; Multilayered structure
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Indexed keywords
ALUMINA;
BIAS VOLTAGE;
CAVITY RESONATORS;
CHEMICAL VAPOR DEPOSITION;
CHROMIUM;
ELECTRON TUBES;
HARDNESS;
LIGHT METALS;
MECHANICAL PROPERTIES;
NONMETALS;
PLASMA DEPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON;
THICK FILMS;
THIN FILMS;
TOOL STEEL;
ARC CURRENTS;
CATHODIC ARC PLASMA DEPOSITION;
CATHODIC ARC PLASMA DEPOSITION SYSTEM;
CRALSIN FILMS;
MAXIMUM HARDNESS;
MULTI-LAYERED STRUCTURES;
MULTILAYERED STRUCTURE;
NANO-CRYSTALLINE;
STEEL SUBSTRATES;
STRUCTURAL PROPERTIES;
AMORPHOUS FILMS;
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EID: 50349101324
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2008.06.019 Document Type: Article |
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Times cited : (52)
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References (14)
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