Study on TiO2 thin films grown by advanced pulsed laser deposition on ITO

Thin Solid Films

Volumn 518, Issue 4, 2009, Pages 1314-1317

  Sima, Cornelia ^a   Grigoriu, Constantin ^a  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

Indium tin oxide; Pulsed laser deposition; Titanium dioxide

Indexed keywords

ANATASE PHASE; ANNEALING PROCESS; FILM STRUCTURE; FUNCTIONAL ELECTRODE; INDIUM TIN OXIDE; ND : YAG LASERS; OPTICAL TRANSMISSIONS; OXYGEN ATMOSPHERE; PULSED LASER; ROOM TEMPERATURE; TETRAGONAL STRUCTURE; THERMAL TREATMENT; THRESHOLD TEMPERATURES; TIO; TITANIUM TARGETS; VISIBLE RANGE;

ATMOSPHERIC TEMPERATURE; DEPOSITION; HEAT TREATMENT; INDIUM; LASERS; LIGHT TRANSMISSION; NEODYMIUM LASERS; OXYGEN; PHOTOLITHOGRAPHY; PULSED LASER DEPOSITION; SURFACE STRUCTURE; TIN; TIN DIOXIDE; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

OPTICAL FILMS;

EID: 71749104109     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.05.049     Document Type: Article

References (48)

1. Chou T.P. Effects of the nanostructure and the chemistry of various oxide electrodes on the overall performance of dye-sensitized solar cells. Materials Science and Engineering, Washington, DC (2006)
2. Sima C., Waldhauser W., Lackner J., Kahn M., Nicolae I., Viespe C., Grigoriu C., and Manea A. J. Optoelectron. Adv. Mater. 9 (2007) 1446
3. Sung Y., and Kim H. Thin Solid Films 515 (2007) 4996
4. Ray S., Dutta U., Das R., and Chatterjee P. J. Phys. D. Appl. Phys. 40 (2007) 2445
5. Rong W.K., Hung T.C., Jen W.J., Chienu L.W., and Hsien L.C. Surf. Coat. Technol. 200 (2006) 6030
6. Lee K. J. Korean Phys. Soc. 46 (2005) 1383
7. Aduda B., Ravirajan P., Choy K., and Nelson J. Int. J. Photoenergy 6 (2004) 141
8. Zhang L., Lin B., Yao N., Fan Z., Yang S., and Lu Z. J. Synth. Cryst. 33 (2004) 667
9. Mardare D., Tasca M., Delibas M., and Rusu G. Appl. Surf. Sci. 156 (2000) 200
10. Wang C., Lin S., and Chen Y. J. Phys. Chem. Solids 69 (2008) 451
11. Yamamoto K., Sakai K., Yoshikado S., Katayama K., Kato K., Takenaka T., Takata M., and Shinozaki K. Electr. Jpn. 350 (2007) 151
12. Sankapal B., Steiner M.L., and Ennaoui A. Appl. Surf. Sci. 239 (2005) 165
13. Mane R., Lee W., Pathan H., and Han S. J. Phys. Chem. B 109 (2005) 24254
14. Murakami T., Kijitori Y., Kawashima N., and Miyasaka T. J. Photoch. Photobiol. A 164 (2004) 187
15. Wang S., Chang W., Ciou J., Wei M., and Wong M. J. Vac. Sci. Technol. A 26 (2008) 898
16. Xu Y., and Shen M. J. Mater. Process. Technol. 202 (2008) 301
17. Murugesan S., Kuppusami P., Parvathavarthini N., and Mohandas E. Surf. Coat. Technol. 201 (2007) 7713
18. Ngaffo F.F., Caricato A.P., Femandez M., Martino M., and Romano F. Appl. Surf. Sci. 253 (2007) 6508
19. Luca D., Macovei D., and Teodorescu C.M. Surf. Sci. 600 (2006) 4342
20. Ohshima T., Nakashima S., Ueda T., Kawasaki H., Suda Y., and Ebihara K. Thin Solid Films 506 (2006) 106
21. Gyorgy E., Socol G., Axente E., Mihailescu I., Ducu C., and Ciuca S. Appl. Surf. Sci. 247 (2005) 429
22. Luca D. J. Optoelectron. Adv. Mater. 7 (2005) 625
23. Lackner J.M., Waldhauser W., Ebner R., Major B., and Schoberl T. Surf. Coat. Technol. 180 (2004) 585
24. Nakamura T., Takahashi H., Yamamoto K., Sato N., Muramatsu A., and Matsubara E. Metall. Mater. Proc. 1 (2003) 1241
25. Sharma A., Thareja R., Willer U., and Schade W. Appl. Surf. Sci. 206 (2003) 137
26. Inoue N., Yuasa H., and Okoshi M. Appl. Surf. Sci. 197 (2002) 393
27. Koshizaki N., Narazaki A., and Sasaki T. Appl. Surf. Sci. 197 (2002) 624
28. Yamamoto S., Sumita T., Miyashita A., and Naramoto H. Thin Solid Films 401 (2001) 88
29. Alarcon L., Poniatowski E., Lopez M., Guasti M., Jarquin J., and Pineda A. Surf. Eng. 15 (1999) 411
30. Fu Z., Kong J., Qin Q., and Tian Z. Sci. China. Ser. B. 42 (1999) 493
31. Durand H., Brimaud J., Hellman O., Shibata H., Sakuragi S., Makita Y., Gesbert D., and Meyrueis P. Appl. Surf. Sci. 86 (1995) 122
32. Gyoergy E., Pino A., Sauthier G., Figueras A., Alsina F., and Pascual J. J. Phys. D. Appl. Phys. 40 (2007) 5246
33. Van Overschelde O., Guisbiers G., and Wautelet M. Appl. Surf. Sci. 253 (2007) 7890
34. Stankova N., Atanasov P., Dikovska A., Dimitrov I., Socol G., and Mihailescu I. Proc. SPIE 5830 (2005) 60
35. Ito H., Takada N., and Sasaki K. Appl. Phys. A. Mater. 79 (2004) 1327
36. Kitazawa S. Jpn. J. Appl. Phys. 43 (2004) 6335
37. Kitazawa S., Choi Y., and Yamamoto S. Vacuum 74 (2004) 637
38. Ayyub P., Chandra R., Taneja P., Sharma A., and Pinto R. Appl. Phys. A. Mater. 73 (2001) 67
39. Kim J., Lee S., and Im H. Appl. Phys. A. Mater. 69 (1999) S629
40. Yoon H., Kim S., and Im H. Bull. Korean Chem. Soc. 18 (1997) 640
41. Hitosugi T., Ueda A., Furubayashi Y., Hirose Y., Konuma S., Shimada T., and Hasegawa T. Jpn. J. Appl. Phys. 46 (2007) L86
42. Ngaffo F., Caricato A., Fazzi A., Fernandez M., Lattante S., Martino M., and Romano F. Appl. Surf. Sci. 248 (2005) 428
43. Thestrup_ B., and Schou J. Appl. Phys. A 69 (1999) S807
44. Adurojida F., Izumi H., Ishihara T., Yoshioka H., and Motoyama M. J. Mater. Sci. Lett. 19 (2000) 1719
45. Craciun V., Craciun D., Wang X., Anderson T., and Singh R. J. Optoelectron. Adv. M. 5 (2003) 401
46. Choi J., Kim J., Jeon K., and Lee S. Mat. Sci. Eng. B 102 (2003) 376
47. Viespe C., Nicolae I., Sima C., Grigoriu C., and Medianu R. Thin Solid Films 515 (2007) 8771
48. Bauerle D. Laser Processing and Chemistry (2000), Springer, NY