Deposition of ITO films on SiO 2 substrates

Applied Surface Science

Volumn 248, Issue 1-4, 2005, Pages 428-432

  Ngaffo, Fernande Fotsa ^a,b   Caricato, Anna Paola ^b   Fazzi, Andrea ^b   Fernandez, Manuel ^b   Lattante, Sandro ^b   Martino, Maurizio ^b   Romano, Francesco ^b  

^a UNIVERSITY OF THE WITWATERSRAND   (South Africa)

^b INFM   (Italy)

Author keywords

Atomic force microscopy; Indium tin oxide; Laser ablation; Pulsed ablation deposition; Refractive index

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; EXCIMER LASERS; LASER ABLATION; LASER PULSES; LIGHT TRANSMISSION; LIQUID CRYSTAL DISPLAYS; PLASMA DISPLAY DEVICES; REFRACTIVE INDEX; SILICA; SUBSTRATES;

COMPUTER CODES; FILM THICKNESS PROFILOMETERS (FTP); INDIUM TIN OXIDES (ITO); PULSED ABLATION DEPOSITION (PAD);

INDIUM COMPOUNDS;

EID: 19844377526     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.03.082     Document Type: Conference Paper

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