Deposition of multilayered titanium thin film by Nd:YAG laser ablation

Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies

Volumn 1, Issue , 2003, Pages 1241-1246

  Nakamura, T ^a   Takahashi, H ^a   Yamamoto, K ^a   Sato, N ^a   Muramatsu, A ^a   Matsubara, E ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; HYDROGEN SULFIDE; LASER ABLATION; MORPHOLOGY; NEODYMIUM LASERS; QUARTZ; TITANIUM; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SULFURIZATION; SURFACE ATOMIC STRUCTURE;

THIN FILMS;

EID: 0141459649     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. R. Asahi, T. Morita, T. Ohwaki, K. Aoki and Y. Tada, "Visible-Light Photocatalysis in Nitrogen-Doped Titanium Oxides" Science, 293(13)(2001), 269-271.
2. R. W. James. The Optical Principles of the Diffraction of X-rays (England: Bell & Hyman, Ltd., 1948).
3. L. G. Parratt, "Surface Studies of Solids by Total Reflection of X-ray," Physical Review, 95(2)(1954), 359-369.