Fabrication of TiO2-based transparent conducting oxide films on glass by pulsed laser deposition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 1-3, 2007, Pages

  Hitosugi, Taro ^a,b   Ueda, Atsuki ^a   Furubayashi, Yutaka ^b   Hirose, Yasushi ^b   Konuma, Seiji ^b   Shimada, Toshihiro ^a,b   Hasegawa, Tetsuya ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Pulsed laser deposition; Titanium dioxide; Transparent conducting oxide

Indexed keywords

OPACITY; PULSED LASER DEPOSITION; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

SUBSTRATE TEMPERATURE; TRANSPARENT CONDUCTING OXIDE;

OXIDE FILMS;

EID: 34249704606     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L86     Document Type: Article

References (9)

1. D. S. Ginley and C. Bright: MRS Bull. 25 (2000) 15.
2. H. L. Hartnagel, A. L. Dawar, A. K. Jain, and C. Jagadish: Semiconducting Transparent Thin Films (Institute of Physics, Bristol, U.K., 1995).
3. Y. Furubayashi, T. Hitosugi, Y. Yamamoto, K. Inaba, G. Kinoda, Y. Hirose, T. Shimada, and T. Hasegawa: Appl. Phys. Lett. 86 (2005) 252101.
4. T. Hitosugi, Y. Furubayashi, A. Ueda, K. Itabashi, K. Inaba, Y. Hirose, G. Kinoda, Y. Yamamoto, T. Shimada, and T. Hasegawa: Jpn. J. Appl. Phys. 44 (2005) L1063.
5. Y. Furubayashi, T. Hitosugi, and T. Hasegawa: Appl. Phys. Lett. 88 (2006) 226103.
6. Y. Furubayashi, T. Hitosugi, Y. Yamamoto, Y. Hirose, G. Kinoda, K. Inaba, T. Shimada, and T. Hasegawa: Thin Solid Films 496 (2006) 157.
7. T. Minami: MRS Bull. 25 (2000) 38.
8. T. Hitosugi and T. Hasegawa: to be published.
9. G. E. Jellison, Jr., L. A. Boatner, J. D. Budai, B.-S. Jeong, and D. P. Norton: J. Appl. Phys. 93 (2003) 9537.