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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 4, 2008, Pages 898-902

Preparation of TiO2 thin films by laser ablation for photocatalytic applications

(5) Wang, S J a Chang, W T b Ciou, J Y b Wei, M K b Wong, M S b

a NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY (Taiwan)

b NATIONAL DONG HWA UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; CHEMICAL VAPOR DEPOSITION; EXCIMER LASERS; FILM PREPARATION; GAS LASERS; KRYPTON; LASER ABLATION; LASER APPLICATIONS; LASERS; LIGHT; LITHOGRAPHY; METEOROLOGICAL INSTRUMENTS; ORGANIC POLYMERS; OXIDE FILMS; OXIDE MINERALS; OXYGEN; PARTIAL PRESSURE; PHOTODEGRADATION; POSITIVE IONS; PRESSURE; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SPECTROSCOPY; SUBSTRATES; SULFATE MINERALS; THICK FILMS; TITANIUM; TITANIUM DIOXIDE; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS;

ANATASE (TIO2); ANATASE PHASE; BAND GAPS; ELECTRON MICROSCOPY (TEM AND SEM); FILM DEPOSITION; FILM STRUCTURES; KRF EXCIMER LASERS; METHYLENE BLUE (MB); MIXED PHASE; MIXED PHASES; OXYGEN PARTIAL PRESSURE (OPP); OXYGEN PRESSURES; PHASE FORMATIONS; PHOTOCATALYTIC; RAMAN SCATTERING SPECTROSCOPY; RUTILE AND ANATASE; RUTILE PHASE; SUBSTRATE TEMPERATURE (ST); SURFACE AREA (SA); TI O2 FILMS; TIO2 THIN FILMS; ULTRAVIOLET (UV) LIGHT; X RAY DIFFRACTION (XRD);

TITANIUM OXIDES;

EID: 46449118791 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.2870228 Document Type: Article

Times cited : (24)

References (27)

1
- 35348875044
- 0028-0836 10.1038/238037a0.
- A. Fujishima and K. Honda, Nature (London) 0028-0836 10.1038/238037a0 238, 37 (1972).
- (1972) Nature (London) , vol.238 , pp. 37
- Fujishima, A.¹ Honda, K.²

2
- 0001039932
- 0927-0248 10.1016/0927-0248(92)90091-3.
- A. Hagfeldt, U. Bjorksten, and S. E. Lindquist, Sol. Energy Mater. Sol. Cells 0927-0248 10.1016/0927-0248(92)90091-3 27, 293 (1992).
- (1992) Sol. Energy Mater. Sol. Cells , vol.27 , pp. 293
- Hagfeldt, A.¹ Bjorksten, U.² Lindquist, S.E.³

3
- 0034762739
- 0959-9428 10.1039/b103818b.
- Y. Zhang and A. Reller, J. Mater. Chem. 0959-9428 10.1039/b103818b 11, 2537 (2001).
- (2001) J. Mater. Chem. , vol.11 , pp. 2537
- Zhang, Y.¹ Reller, A.²

4
- 0037024354
- 0935-9648
- U. Bach, D. Corr, D. Lupo, F. Pichot, and M. Ryan, Adv. Mater. 14, 845 (2002). 0935-9648
- (2002) Adv. Mater. , vol.14 , pp. 845
- Bach, U.¹ Corr, D.² Lupo, D.³ Pichot, F.⁴ Ryan, M.⁵

5
- 4544235448
- A. L. Linsebigler, G. Lu, and J. T. Yates, Chem. Rev. 95, 735 (1995).
- (1995) Chem. Rev. , vol.95 , pp. 735
- Linsebigler, A.L.¹ Lu, G.² Yates, J.T.³

6
- 0039129509
- 0009-2665
- M. R. Hoffmann, S. T. Martin, and D. W. Bahneman, Chem. Rev. 95, 69 (1995). 0009-2665
- (1995) Chem. Rev. , vol.95 , pp. 69
- Hoffmann, M.R.¹ Martin, S.T.² Bahneman, D.W.³

7
- 43949175062
- 0013-4686
- E. Pelizzetti and C. Minero, Electrochim. Acta 38, 47 (1993). 0013-4686
- (1993) Electrochim. Acta , vol.38 , pp. 47
- Pelizzetti, E.¹ Minero, C.²

8
- 0035500933
- 0947-8396.
- D. -J. Won, C. -H. Wang, H. -K. Jang, and D. -J. Choi, Appl. Phys. A: Mater. Sci. Process. 0947-8396 A73, 595 (2001).
- (2001) Appl. Phys. A: Mater. Sci. Process. , vol.73 , pp. 595
- Won, D.-J.¹ Wang, C.-H.² Jang, H.-K.³ Choi, D.-J.⁴

9
- 34548186193
- 0163-1829 10.1103/PhysRevB.51.13023.
- S. D. Mo and W. Y. Ching, Phys. Rev. B 0163-1829 10.1103/PhysRevB.51. 13023 51, 13023 (1995).
- (1995) Phys. Rev. B , vol.51 , pp. 13023
- Mo, S.D.¹ Ching, W.Y.²

10
- 0028368703
- 0021-8979 10.1063/1.356306.
- H. Tang, K. Prasad, R. Sanjinnes, P. E. Schmid, and F. Levy, J. Appl. Phys. 0021-8979 10.1063/1.356306 75, 2042 (1994).
- (1994) J. Appl. Phys. , vol.75 , pp. 2042
- Tang, H.¹ Prasad, K.² Sanjinnes, R.³ Schmid, P.E.⁴ Levy, F.⁵

11
- 0037376980
- 0167-2584 10.1016/S0039-6028(03)00117-1.
- N. Ruzycki, G. S. Herman, L. A. Boatner, and U. Diebold, Surf. Sci. Lett. 0167-2584 10.1016/S0039-6028(03)00117-1 529, L239 (2003).
- (2003) Surf. Sci. Lett. , vol.529 , pp. 239
- Ruzycki, N.¹ Herman, G.S.² Boatner, L.A.³ Diebold, U.⁴

12
- 13244292473
- 1089-5647 10.1021/jp045395d.
- D. C. Hurum, K. A. Gray, T. Rajh, and M. C. Thurnauer, J. Phys. Chem. B 1089-5647 10.1021/jp045395d 109, 977 (2005).
- (2005) J. Phys. Chem. B , vol.109 , pp. 977
- Hurum, D.C.¹ Gray, K.A.² Rajh, T.³ Thurnauer, M.C.⁴

13
- 33750429295
- 0040-6090.
- L. Chen, M. E. Graham, G. Li, and K. A. Gray, Thin Solid Films 0040-6090 515, 1176 (2006).
- (2006) Thin Solid Films , vol.515 , pp. 1176
- Chen, L.¹ Graham, M.E.² Li, G.³ Gray, K.A.⁴

14
- 0036149532
- 0040-6090.
- C. Ting, S. Chen, and D. Liu, Thin Solid Films 0040-6090 402, 290 (2002).
- (2002) Thin Solid Films , vol.402 , pp. 290
- Ting, C.¹ Chen, S.² Liu, D.³

15
- 0142011540
- 0038-1101 10.1016/S0038-1101(03)00210-7.
- B. -S. Jeong, D. P. Nortona, and J. D. Budai, Solid-State Electron. 0038-1101 10.1016/S0038-1101(03)00210-7 47, 2275 (2003).
- (2003) Solid-State Electron. , vol.47 , pp. 2275
- Jeong, B.-S.¹ Nortona, D.P.² Budai, J.D.³

16
- 0032482850
- 0040-6090 10.1016/S0040-6090(98)00573-2.
- F. Zhang and X. Liu, Thin Solid Films 0040-6090 10.1016/S0040-6090(98) 00573-2 326, 171 (1998).
- (1998) Thin Solid Films , vol.326 , pp. 171
- Zhang, F.¹ Liu, X.²

17
- 0033715072
- 0040-6090 10.1016/S0040-6090(00)01015-4.
- D. Mergel, U. D. Buschendorfa, S. Eggerta, R. Grammesb, and B. Samsetc, Thin Solid Films 0040-6090 10.1016/S0040-6090(00)01015-4 371, 218 (2000).
- (2000) Thin Solid Films , vol.371 , pp. 218
- Mergel, D.¹ Buschendorfa, U.D.² Eggerta, S.³ Grammesb, R.⁴ Samsetc, B.⁵

18
- 33846484204
- 0257-8972
- X. Cheng, S. Hu, P. Zeng, T. Kuang, G. Xie, and F. Gao, Surf. Coat. Technol. 201, 5552 (2007). 0257-8972
- (2007) Surf. Coat. Technol. , vol.201 , pp. 5552
- Cheng, X.¹ Hu, S.² Zeng, P.³ Kuang, T.⁴ Xie, G.⁵ Gao, F.⁶

19
- 0032473243
- 0040-6090.
- H. Lin, H. Kozuka, and T. Yoko, Thin Solid Films 0040-6090 315, 111 (1998).
- (1998) Thin Solid Films , vol.315 , pp. 111
- Lin, H.¹ Kozuka, H.² Yoko, T.³

20
- 0037441138
- 0169-4332
- A. K. Sharma, R. K. Thareja, U. Wilier, and W. Schade, Appl. Surf. Sci. 206, 137 (2003). 0169-4332
- (2003) Appl. Surf. Sci. , vol.206 , pp. 137
- Sharma, A.K.¹ Thareja, R.K.² Wilier, U.³ Schade, W.⁴

21
- 1842681798
- 0257-8972
- J. M. Lackner, W. Waldhauser, R. Ebnera, B. Majord, and T. Schöberle, Surf. Coat. Technol. 180-181, 585 (2004). 0257-8972
- (2004) Surf. Coat. Technol. , vol.180-181 , pp. 585
- Lackner, J.M.¹ Waldhauser, W.² Ebnera, R.³ Majord, B.⁴ Schöberle, T.⁵

22
- 10044266808
- 1359-6454 10.1016/j.actamat.2004.09.026.
- T. Nakamura, T. Ichitsubo, E. Matsubara, A. Muramatsu, N. Sato, and H. Takahashi, Acta Mater. 1359-6454 10.1016/j.actamat.2004.09.026 53, 323 (2005).
- (2005) Acta Mater. , vol.53 , pp. 323
- Nakamura, T.¹ Ichitsubo, T.² Matsubara, E.³ Muramatsu, A.⁴ Sato, N.⁵ Takahashi, H.⁶

23
- 33644921303
- 0022-0248 10.1016/j.jcrysgro.2005.11.099.
- P. Xu, L. Mi, and P. Wang, J. Cryst. Growth 0022-0248 10.1016/j.jcrysgro.2005.11.099 289, 433 (2006).
- (2006) J. Cryst. Growth , vol.289 , pp. 433
- Xu, P.¹ Mi, L.² Wang, P.³

24
- 0032762002
- 0169-4332
- L. Escobar-Alarcon, E. Haro-Poniatowski, and M. A. Chamacho-Lopez, Appl. Surf. Sci. 137, 38 (1999). 0169-4332
- (1999) Appl. Surf. Sci. , vol.137 , pp. 38
- Escobar-Alarcon, L.¹ Haro-Poniatowski, E.² Chamacho-Lopez, M.A.³

25
- 10044253044
- M. -H. Tsai, S. -Y. Chen, and P. Shen, J. Aerosp. Sci. 36, 13 (2005).
- (2005) J. Aerosp. Sci. , vol.36 , pp. 13
- Tsai, M.-H.¹ Chen, S.-Y.² Shen, P.³

26
- 33646698210
- 0734-2101 10.1116/1.2187993.
- J. Musil, D. Heman, and J. Šicha, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.2187993 24, 521 (2006).
- (2006) J. Vac. Sci. Technol. A , vol.24 , pp. 521
- Musil, J.¹ Heman, D.² Šicha, J.³

27
- 0029546658
- 0098-6445
- M. C. Lu, G. D. Roam, J. N. Chen, and C. P. Huang, Chem. Eng. Commun. 139, 1 (1995). 0098-6445
- (1995) Chem. Eng. Commun. , vol.139 , pp. 1
- Lu, M.C.¹ Roam, G.D.² Chen, J.N.³ Huang, C.P.⁴

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