SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 401, Issue 1-2, 2001, Pages 88-93

Preparation of epitaxial TiO2 films by pulsed laser deposition technique

(5) Yamamoto, S a Sumita, T a Sugiharuto, a Miyashita, A a Naramoto, H b

a JAERI Takasaki ^* (Japan)

b Japan Atomic Energy Research Institute (Japan)

Author keywords

Epitaxy; Laser ablation; Rutherford backscattering spectroscopy; Titanium oxide

Indexed keywords

ENERGY GAP; EPITAXIAL GROWTH; LATTICE CONSTANTS; LIGHT ABSORPTION; NEODYMIUM LASERS; PHOTOCONDUCTIVITY; PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

EPITAXIAL ANATASE FILMS;

METALLIC FILMS;

EID: 0035904951 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01636-4 Document Type: Article

Times cited : (142)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.