Effect of azimuthally asymmetric reactor components on a parallel plate capacitively coupled plasma

Journal of Applied Physics

Volumn 106, Issue 10, 2009, Pages

  Kenney, Jason A ^a   Rauf, Shahid ^a   Collins, Ken ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

A-CENTER; ACCESS PORTS; ARGON DISCHARGES; AZIMUTHAL VARIATIONS; BOTTOM ELECTRODES; CAPACITIVELY COUPLED PLASMAS; CIRCULAR PLATES; DENSITY PROFILE; GROUNDED SURFACES; HIGH FREQUENCY; INTERELECTRODES; ION FLUXES; OFF-AXIS; PARALLEL ELECTRODES; PARALLEL PLATES; PLASMA MODEL; SPATIAL CHARACTERISTICS; VERY HIGH FREQUENCY;

ARGON; COUPLED CIRCUITS; ELECTRODES; INDUCTIVELY COUPLED PLASMA; THREE DIMENSIONAL; WIRELESS TELECOMMUNICATION SYSTEMS;

ELECTRIC DISCHARGES;

EID: 71749100410     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3259420     Document Type: Article

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