SCOPUS 정보 검색 플랫폼

Volumn 46, Issue 11, 2007, Pages 7453-7459

Control of the harmonics generation in a capacitively coupled plasma reactor

Author keywords

Capacitively coupled plasma; Harmonic; Impedance; Resonance; RF

Indexed keywords

CAPACITANCE MEASUREMENT; CARRIER CONCENTRATION; ELECTRIC IMPEDANCE; EQUIVALENT CIRCUITS; RESONANCE;

CAPACITIVELY COUPLED PLASMA; HARMONIC FREQUENCY; WAFER-ELECTRODE REACTANCE;

HARMONIC GENERATION;

EID: 35948959793 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.46.7453 Document Type: Article

Times cited : (18)

References (15)

1
- 0029487568
- M. A. Sobolewski: IEEE Trans. Plasma. Sci. 23 (1995) 1006.
- (1995) IEEE Trans. Plasma. Sci , vol.23 , pp. 1006
- Sobolewski, M.A.¹

2
- 0036572607
- M. N. A. Dewan, P. J. MeNally, and P. A. F. Herbert: J. Appl. Phys. 91 (2002) 5604.
- (2002) J. Appl. Phys , vol.91 , pp. 5604
- Dewan, M.N.A.¹ MeNally, P.J.² Herbert, P.A.F.³

3
- 0000590902
- M. Klick: J. Appl. Phys. 79 (1996) 3445.
- (1996) J. Appl. Phys , vol.79 , pp. 3445
- Klick, M.¹

4
- 0003730831
- Wiley, New York
- M. A. Lieberman and A. J. Lichtenberg: Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994) p. 331.
- (1994) Principles of Plasma Discharges and Materials Processing , pp. 331
- Lieberman, M.A.¹ Lichtenberg, A.J.²

5
- 33646148243
- T. Mussenbrock and R. P. Brinkmann: Appl. Phys. Lett. 88 (2006) 151503.
- (2006) Appl. Phys. Lett , vol.88 , pp. 151503
- Mussenbrock, T.¹ Brinkmann, R.P.²

6
- 36449004205
- P. A. Miller, H. Anderson, and M. P. Splichal: J. Appl. Phys. 71 (1992) 1171.
- (1992) J. Appl. Phys , vol.71 , pp. 1171
- Miller, P.A.¹ Anderson, H.² Splichal, M.P.³

7
- 0040742982
- J. Forster: Appl. Phys. Lett. 62 (1993) 3429.
- (1993) Appl. Phys. Lett , vol.62 , pp. 3429
- Forster, J.¹

8
- 0028461720
- H. Kawata, T. Kubo, and K. Murata: Jpn. J. Appl. Phys. 33 (1994) 4365.
- (1994) Jpn. J. Appl. Phys , vol.33 , pp. 4365
- Kawata, H.¹ Kubo, T.² Murata, K.³

9
- 0034315704
- L. Berry, H. Maynard, P. A. Miller, T. Moore, M. Pendley, V. Resta, D. Sparks, and Q. Yang: J. Vac. Sci. Technol. A 18 (2000) 2806.
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 2806
- Berry, L.¹ Maynard, H.² Miller, P.A.³ Moore, T.⁴ Pendley, M.⁵ Resta, V.⁶ Sparks, D.⁷ Yang, Q.⁸

10
- 0001600183
- S. Rauf and M. J. Kushner: J. Appl. Phys. 83 (1998) 5087.
- (1998) J. Appl. Phys , vol.83 , pp. 5087
- Rauf, S.¹ Kushner, M.J.²

11
- 0001290374
- P. A. Miller and M. E. Riley: J. Appl. Phys. 82 (1997) 3689.
- (1997) J. Appl. Phys , vol.82 , pp. 3689
- Miller, P.A.¹ Riley, M.E.²

12
- 3743087684
- P. A. Miller, L. A. Romero, and P. D. Pochan: Phys. Rev. Lett. 71 (1993) 863.
- (1993) Phys. Rev. Lett , vol.71 , pp. 863
- Miller, P.A.¹ Romero, L.A.² Pochan, P.D.³

13
- 0041875888
- P. A. Miller and K. E. Greenberg: Appl. Phys. Lett. 60 (1992) 2859.
- (1992) Appl. Phys. Lett , vol.60 , pp. 2859
- Miller, P.A.¹ Greenberg, K.E.²

14
- 35948937418
- Tokyo
- L. Chen, Y. Tsukamoto, F. Higuchi, M. Hagihara, Y. Yamazawa, T. Tatsumi, and A. Kawashima: Proc. 26th Int. Symp. Dry Process, Tokyo, 2004, p. 199.
- (2004) Proc. 26th Int. Symp. Dry Process , pp. 199
- Chen, L.¹ Tsukamoto, Y.² Higuchi, F.³ Hagihara, M.⁴ Yamazawa, Y.⁵ Tatsumi, T.⁶ Kawashima, A.⁷

15
- 0033322118
- H. Kokura, K. Nakamura, I. V. Ghanashev, and H. Sugai: Jpn. J. Appl. Phys. 38 (1999) 5262.
- (1999) Jpn. J. Appl. Phys , vol.38 , pp. 5262
- Kokura, H.¹ Nakamura, K.² Ghanashev, I.V.³ Sugai, H.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.