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Volumn 106, Issue 10, 2009, Pages

Enhanced mass transport in ultrarapidly heated Ni/Si thin-film multilayers

(11) Cook, L P a,b Cavicchi, R E a Bassim, N a,c Eustis, S a,d Wong Ng, W a Levin, I a Kattner, U R a Campbell, C E a Montgomery, C B a Egelhoff, W F a Vaudin, M D a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

b PhazePro Technologies (United States)

c NAVAL RESEARCH LABORATORY (United States)

d Directed Vapor Technologies International Inc (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BI-LAYER; BI-LAYER FILMS; CROSS SECTION; FOCUSED ION BEAM MILLING; GROWTH PROCESS; INTER-DIFFUSION; MASS TRANSPORT; METASTABLE LIQUID; NANOFABRICATION; SCAN RATES; SCANNING CALORIMETRY; SILICIDATION; SOLID PHASIS; SOLID-STATE DIFFUSION; TEM; TEMPERATURE-TIME REGIME; THERMODYNAMIC PREDICTIONS;

EXPERIMENTS; FILM PREPARATION; HEATING; METASTABLE PHASES; MICROCRYSTALLINE SILICON; MICROSTRUCTURE; MULTILAYER FILMS; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; TRANSMISSION ELECTRON MICROSCOPY;

MULTILAYERS;

EID: 71749100213 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3254225 Document Type: Article

Times cited : (19)

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