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Volumn 342, Issue 1, 2010, Pages 192-197
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Breath figure lithography: A facile and versatile method for micropatterning
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Author keywords
Block copolymer; Lithography; Reactive ions etching
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Indexed keywords
BLOCK COPOLYMER LITHOGRAPHY;
BREATH FIGURES;
ETCHING RATE;
FACILE METHOD;
ICP-RIE;
INDUCTIVELY COUPLED-PLASMA REACTIVE ION ETCHING;
MICRO PATTERN;
MICRO PATTERNING;
MICROPATTERNS;
POROUS POLYMER FILMS;
REACTIVE ION;
SOLID SUBSTRATES;
SPUTTER COATING;
VERSATILE METHODS;
BLOCK COPOLYMERS;
COPOLYMERIZATION;
INDUCTIVELY COUPLED PLASMA;
IONS;
LITHOGRAPHY;
POLYMER FILMS;
POROUS SILICON;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
SILICONES;
SUBSTRATES;
REACTIVE ION ETCHING;
GOLD;
POLYMER;
SILICON;
SILOXANE;
ARTICLE;
BIOTECHNOLOGICAL PROCEDURES;
BREATH FIGURE LITHOGRAPHY;
CHEMICAL ANALYSIS;
CHEMICAL PROCEDURES;
CHEMICAL STRUCTURE;
CONTROLLED STUDY;
COUPLED PLASMA REACTIVE ION ETCHING;
MATERIAL COATING;
PRIORITY JOURNAL;
SOLID;
SYNTHESIS;
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EID: 71649098905
PISSN: 00219797
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcis.2009.10.005 Document Type: Article |
Times cited : (40)
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References (35)
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