Fabrication of nanodot plasmonic waveguide structures using FIB milling and electron beam-induced deposition

Scanning

Volumn 31, Issue 4, 2009, Pages 139-146

  Dhawan, Anuj ^a,b   Gerhold, Michael ^a,b   Madison, Andrew ^c   Fowlkes, Jason ^d   Russell, Phillip E ^c   Vo Dinh, Tuan ^b   Leonard, Donovan N ^c  

^a U S ARMY RESEARCH OFFICE   (United States)

^b Duke University   (United States)

^c APPALACHIAN STATE UNIVERSITY   (United States)

^d OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Electron beam induced deposition; Localized surface plasmon resonance; Nanostructures; Plasmonic waveguide; Surface plasmons

Indexed keywords

COATED GLASS; COATED GLASS SUBSTRATES; DARK FIELD; DIFFERENT PROCESS; ELECTRON BEAM-INDUCED DEPOSITION; FABRICATED STRUCTURES; FABRICATION METHOD; FABRICATION PROCESS; FDTD SIMULATIONS; FIB MILLING; FINITE-DIFFERENCE TIME-DOMAIN MODELING; FOCUSED ION BEAM MILLING; INDIUM TIN OXIDE; LINEAR ARRAYS; LOCALIZED SURFACE PLASMON RESONANCE; LOW ASPECT RATIO; METALLIC NANORODS; METALLIC NANOSTRUCTURE; MULTI-STEP; NANODOT STRUCTURES; NANODOTS; NANOPILLARS; NANOSTRUCTURE FABRICATION; NANOSTRUCTURE SIZE; OPTIMAL SIZE; ORGANOMETALLIC PRECURSORS; PLANAR SUBSTRATE; PLASMON RESONANCES; PLASMONIC RESPONSE; PLASMONIC WAVEGUIDES;

ARRAY PROCESSING; ASPECT RATIO; CONDUCTIVE FILMS; DEPOSITION; ELECTROMAGNETIC FIELDS; ELECTRON BEAMS; ELECTRONS; FINITE DIFFERENCE TIME DOMAIN METHOD; FOCUSED ION BEAMS; GLASS; GOLD; MICA; MILLING (MACHINING); NANORODS; NANOSTRUCTURED MATERIALS; OPTICAL DATA STORAGE; OPTICAL FIBER FABRICATION; OPTICAL FIBERS; OPTICAL MICROSCOPY; ORGANOMETALLICS; OXIDE MINERALS; QUARTZ; SILICATE MINERALS; SUBSTRATES; SURFACE PLASMON RESONANCE; TIN; TITANIUM; TITANIUM OXIDES; WAVEGUIDES;

PLASMONS;

GLASS; GOLD; INDIUM; MICA; NANOMATERIAL; NANOROD; ORGANOMETALLIC COMPOUND; QUANTUM DOT; SILICON DIOXIDE; TIN OXIDE; TITANIUM;

ACCURACY; ARTICLE; CONTROLLED STUDY; ELECTROMAGNETIC FIELD; ELECTRON BEAM; FILM; GAS; GEOMETRY; MICROSCOPY; MOLECULAR SIZE; NANOFABRICATION; PREDICTION; PRIORITY JOURNAL; PROCESSING; SIMULATION; SPECTRAL SENSITIVITY;

COMMINUTION; CONDUCTIVITY; DATA STORAGE; ELECTRON BEAMS; FIBER OPTICS; FINITE ELEMENT ANALYSIS; GLASS; GOLD; IONS; MICA; QUANTUM CHEMISTRY; SILICATES; THIN FILMS; TITANIUM DIOXIDE;

EID: 70449674639     PISSN: 01610457     EISSN: None     Source Type: Journal    
DOI: 10.1002/sca.20152     Document Type: Article

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