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Volumn 70, Issue 1, 2006, Pages 20-24

High-temperature oxidation of sintered β-FeSi 2 bodies at elevated temperatures

Author keywords

FeSi 2 FeSi; Oxidation layer; Oxidation resistance; Parabolic rate constant; SiO 2

Indexed keywords

Β-FESI2; Ε-FESI; OXIDATION LAYERS; PARABOLIC RATE CONSTANTS;

EID: 33644789158     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet.70.20     Document Type: Article
Times cited : (8)

References (21)
  • 4
  • 12
    • 0342316115 scopus 로고
    • Advanced Metallization and Processing for Semiconductor Devices and Circuits II, Ed. by A. Katz, S. P. Murarka, Y. I. Nissim, J. M. E. Harper, (Materials Research Society, Pittsburgh, PA)
    • N. Lundberg, U. Erlesand and M. Östling: Advanced Metallization and Processing for Semiconductor Devices and Circuits II, Mat. Res. Soc. Symp. Proc. 260, Ed. by A. Katz, S. P. Murarka, Y. I. Nissim, J. M. E. Harper, (Materials Research Society, Pittsburgh, PA, 1992) pp. 417-422.
    • (1992) Mat. Res. Soc. Symp. Proc. , vol.260 , pp. 417-422
    • Lundberg, N.1    Erlesand, U.2    Östling, M.3
  • 19
    • 35848953179 scopus 로고    scopus 로고
    • The American Chemical Society, Yew York and The American Institute of Physics, Washington DC
    • th Edition, Part II, (The American Chemical Society, Yew York and The American Institute of Physics, Washington DC, 1998) p. 1751.
    • (1998) th Edition, Part II , pp. 1751
    • Chase Jr., M.W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.