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Volumn 19, Issue 7, 2000, Pages 537-538
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Low temperature growth of β-FeSi2 films on Si(111) by RF magnetron sputtering using a FeSi2 alloy target
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL STRUCTURE;
DEPOSITION;
FILM GROWTH;
FILM PREPARATION;
IRON ALLOYS;
LATTICE CONSTANTS;
LOW TEMPERATURE EFFECTS;
MAGNETRON SPUTTERING;
PHASE COMPOSITION;
RAMAN SCATTERING;
SEMICONDUCTING SILICON;
X RAY DIFFRACTION ANALYSIS;
FILM THICKNESS;
IRON SILICON ALLOY TARGET;
LOW SUBSTRATE TEMPERATURE;
SEMICONDUCTING FILMS;
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EID: 0033871377
PISSN: 02618028
EISSN: None
Source Type: Journal
DOI: 10.1023/A:1006722205010 Document Type: Article |
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Times cited : (8)
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References (9)
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