Effect of Ar plasma distribution in RF-magnetron-sputtering on crystallinity and thermoelectric properties of FeSi2 films

International Conference on Thermoelectrics, ICT, Proceedings

Volumn 2003-January, Issue , 2003, Pages 391-394

  Kamata, K ^a   Anzai, H ^a   Sugita, M ^a   Oikawa, Y ^a   Ozaki, H ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

Argon; Crystallization; Iron; Magnetic properties; Plasma properties; Plasma temperature; Radio frequency; Sputtering; Temperature distribution; Thermoelectricity

Indexed keywords

ARGON; CRYSTALLIZATION; IRON; MAGNETIC PROPERTIES; MAGNETOPLASMA; MAGNETRON SPUTTERING; SPUTTERING; TEMPERATURE DISTRIBUTION; THERMOELECTRIC EQUIPMENT;

COMPOSITION RATIO; IN-PLANE COMPONENTS; PLASMA PROPERTIES; PLASMA TEMPERATURE; RADIO FREQUENCIES; RF-MAGNETRON SPUTTERING; TEMPERATURE RANGE; THERMOELECTRIC PROPERTIES;

THERMOELECTRICITY;

EID: 84946088446     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICT.2003.1287530     Document Type: Conference Paper

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