T-shape filtered arc deposition system with built-in electrostatic macro-particle trap for DLC film preparation

Thin Solid Films

Volumn 518, Issue 5, 2009, Pages 1498-1502

  Kamiya, Masao ^a,b   Yanagita, Taichiro ^a   Tanoue, Hideto ^a   Oke, Shinichiro ^a   Suda, Yoshiyuki ^a   Takikawa, Hirofumi ^a   Taki, Makoto ^c   Hasegawa, Yushi ^c   Ishikawa, Takeshi ^d   Yasui, Haruyuki ^e  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b Itoh Optical Industrial Co Ltd   (Japan)

^c Onward Ceramic Coating Co Ltd   (Japan)

^d HITACHI LTD   (Japan)

^e INDUSTRIAL RESEARCH INSTITUTE OF ISHIKAWA   (Japan)

Author keywords

DLC film; Droplet reduction; Electrostatic trap (ES trap); T shape filtered arc deposition (T FAD)

Indexed keywords

CURRENT FLOWING; DLC FILM; DROPLET REDUCTION; ELECTROMAGNETIC PLASMAS; ELECTROSTATIC TRAP (ES-TRAP); GRAPHITE CATHODES; HIGH-QUALITY DIAMONDS; ION CURRENTS; MACRO-PARTICLES; OPTIMUM CONDITIONS; OPTIMUM VOLTAGES; PARTICLE TRAPS; PLASMA BEAM; T-SHAPE FILTERED ARC DEPOSITION; T-SHAPE FILTERED ARC DEPOSITION (T-FAD); TRAP POSITIONS;

CARBON FILMS; CAVITY RESONATORS; DEPOSITION; DEPOSITION RATES; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; DROP FORMATION; DUCTS; ELECTROSTATICS; GRAPHITE; PLASMA DEPOSITION;

FILM PREPARATION;

EID: 70449493493     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.09.091     Document Type: Article

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