Influence of duct bias on deposition rate of DLC film in T-shape filtered arc deposition

Vacuum

Volumn 80, Issue 11-12, 2006, Pages 1266-1271

  Iwasaki, Yasuhiro ^a   Minamisawa, Shinji ^a   Takikawa, Hirofumi ^a   Sakakibara, Tateki ^a   Hasegawa, Hiroshi ^b  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b Onward Ceramic Coating Co Ltd   (Japan)

Author keywords

Deposition rate; Diamond like carbon (DLC) film; Duct bias; Ion current; T shape filtered arc deposition (T FAD)

Indexed keywords

DEPOSITION; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; PLASMAS; VACUUM APPLICATIONS;

DEPOSITION RATE; DIAMOND-LIKE CARBON (DLC) FILM; DUCT BIAS; ION CURRENT; T-SHAPE FILTERED ARC DEPOSITION (T-FAD); VACUUM ARC DISCHARGE;

DIAMOND LIKE CARBON FILMS;

EID: 33747765158     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.01.060     Document Type: Article

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