Development of X-shaped filtered-arc-deposition (X-FAD) apparatus and DLC/Cr film preparation

IEEE Transactions on Plasma Science

Volumn 35, Issue 4 II, 2007, Pages 1014-1019

  Tanoue, Hideto ^a   Hikosaka, Hiroki ^a   Iwasaki, Yasuhiro ^a   Takikawa, Hirofumi ^a   Sakakibara, Tateki ^b   Hasegawa, Yushi ^c  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b GIFU NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^c Onward Ceramic Coating Co Ltd   (Japan)

Author keywords

Binding interlayer; Chromium (Cr) film; Diamond like carbon (DLC); Hydrogen free tetrahedral amorphous carbon (ta C); X shape filtered arc deposition (X FAD) system

Indexed keywords

AMORPHOUS CARBON; BEAM PLASMA INTERACTIONS; CHROMIUM; DIAMOND LIKE CARBON FILMS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

CHROMIUM FILM; HYDROGEN-FREE TETRAHEDRAL AMORPHOUS CARBON; X-SHAPE FILTERED-ARC DEPOSITION (X-FAD) SYSTEM;

PLASMA DEPOSITION;

EID: 34548314571     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2007.896755     Document Type: Conference Paper

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