Thermal stability of diamond-like carbon films deposited by plasma based ion implantation technique with bipolar pulses

Diamond and Related Materials

Volumn 15, Issue 4-8, 2006, Pages 948-951

  Choi, Junho ^a   Miyagawa, Soji ^a   Nakao, Setsuo ^a   Ikeyama, Masami ^a   Miyagawa, Yoshiko ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Bipolar type PBII; Diamond like carbon; Friction; Thermal stability

Indexed keywords

ANNEALING; ELECTRIC POTENTIAL; ION IMPLANTATION; PLASMAS; SILICON; THERMODYNAMIC STABILITY;

BIPOLAR-TYPE PBII; DIAMOND-LIKE CARBON; RAMAN SPECTRUM; SILICON OXIDE LAYERS;

DIAMOND LIKE CARBON FILMS;

EID: 33745243251     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.11.013     Document Type: Article

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