Electrochemical and thermal grafting of alkyl grignard reagents onto (100) silicon surfaces

Langmuir

Volumn 25, Issue 21, 2009, Pages 12750-12756

  Vegunta, Sri Sai S ^a   Ngunjiri, Johnpeter N ^a   Flake, John C ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYL GROUPS; ALKYLATION REACTIONS; AMBIENT CONDITIONS; COVALENT ATTACHMENT; ELECTROCHEMICAL BEHAVIORS; ELECTROGRAFTING; GRAFTING METHOD; GRIGNARD REAGENT; GRIGNARD SPECIES; HYDROGEN ABSTRACTION; NATIVE OXIDES; PASSIVATION METHODS; SILICON ATOMS; SILICON SURFACES; TETRA-HYDROFURAN; THERMAL METHODS; XPS;

ALKYLATION; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CYCLIC VOLTAMMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAFTING (CHEMICAL); HYDROCARBONS; PASSIVATION; SPECTROSCOPIC ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

DYES, REAGENTS, INDICATORS, MARKERS AND BUFFERS; SILICON;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTROCHEMISTRY;

ELECTROCHEMISTRY; INDICATORS AND REAGENTS; MICROSCOPY, ATOMIC FORCE; SILICON;

EID: 70449450082     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la9018103     Document Type: Article

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