Nanofluidic channels by anodic bonding of amorphous silicon to glass to study ion-accumulation and ion-depletion effect

Talanta

Volumn 68, Issue 3, 2006, Pages 659-665

  Datta, Arindom ^a,b   Gangopadhyay, Shubhra ^a,c   Temkin, Henryk ^a   Pu, Qiaosheng ^a   Liu, Shaorong ^a  

^a TEXAS TECH UNIVERSITY   (United States)

^b Wisconsin Electric Machines and Power Electronics Consortium   (United States)

^c UNIVERSITY OF MISSOURI   (United States)

Author keywords

Amorphous silicon; Ion accumulation; Ion depletion; Ion enrichment; Nanochannels

Indexed keywords

ANODES; BONDING; DEPOSITION; ELECTRIC POTENTIAL; FLUIDICS; GLASS; NANOSTRUCTURED MATERIALS;

ION ENRICHMENT; ION-ACCUMULATION; ION-DEPLETION; NANOCHANNELS;

AMORPHOUS SILICON;

EID: 30144435241     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.talanta.2005.05.011     Document Type: Article

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