Reverse pattern duplication utilizing a two-step metal lift-off process via nanoimprint lithography

Journal of Micromechanics and Microengineering

Volumn 19, Issue 10, 2009, Pages

  Song, Sun Sik ^a   Kim, Eun Uk ^a   Jung, Hee Soo ^a   Kim, Ki Seok ^a   Jung, Gun Young ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AQUA-REGIA SOLUTION; CHROMIUM LAYER; DRY ETCHING PROCESS; ETCHING MASKS; FEATURE SIZES; GOLD DOT; HOLE PATTERNS; LASER INTERFERENCE LITHOGRAPHY; LIFT-OFF PROCESS; PATTERN FABRICATION; SELECTIVE ETCHING; SELECTIVE WET ETCHING; SILICON SUBSTRATES; UV-BASED NANOIMPRINT LITHOGRAPHIES;

CHROMIUM; DISSOLUTION; GOLD; NANOIMPRINT LITHOGRAPHY; WET ETCHING;

DRY ETCHING;

EID: 70350635683     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/10/105022     Document Type: Article

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