Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units

Thin Solid Films

Volumn 518, Issue 3, 2009, Pages 1006-1011

  Setsuhara, Yuichi ^a,f   Cho, Ken ^a   Takenaka, Kosuke ^a,f   Ebe, Akinori ^b   Shiratani, Masaharu ^c,f   Sekine, Makoto ^d,f   Hori, Masaru ^d,f   Ikenaga, Eiji ^e   Kondo, Hiroki ^d   Nakatsuka, Osamu ^d   Zaima, Shigeaki ^d  

^a OSAKA UNIVERSITY   (Japan)

^b EMD Corporation   (Japan)

^c KYUSHU UNIVERSITY   (Japan)

^d NAGOYA UNIVERSITY   (Japan)

^e JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^f JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Hard X ray photoelectron spectroscopy; Inductively coupled plasma; Low damage process; Low inductance antenna; Polymer

Indexed keywords

ARGON ION; ARGON/OXYGEN MIXTURE PLASMA; CHEMICAL BONDING STATE; ETCHING DEPTH; ETCHING RATE; EXPOSURE-TIME; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; ION ENERGIES; KINETIC ENERGY DISTRIBUTIONS; LOW-DAMAGE PROCESS; LOW-INDUCTANCE ANTENNA; ORIGINAL SAMPLE; PLASMA SURFACE TREATMENT; RF PLASMA; ROOT-MEAN-SQUARE VALUES; SURFACE MODIFICATION; WATER-COOLED SUBSTRATES;

ANTENNAS; ARGON; CHEMICAL BONDS; ETCHING; INDUCTANCE; INDUCTIVELY COUPLED PLASMA; MIXTURES; PHOTODEGRADATION; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; PHOTORESISTS; POLYMERS; SURFACE ROUGHNESS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 70350499540     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.07.161     Document Type: Article

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