Fabrication of micro/nano-structures using focused ion beam implantation and XeF2 gas-assisted etching

Journal of Micromechanics and Microengineering

Volumn 19, Issue 5, 2009, Pages

  Xu, Z W ^a,b   Fang, F Z ^a,b   Fu, Y Q ^c   Zhang, S J ^a   Han, T ^a   Li, J M ^b  

^a TIANJIN UNIVERSITY   (China)

^b Tianjin MicroNano Manufacturing Tech Co Ltd   (China)

^c UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CROSS-SECTION CUTTING; ETCHING MASKS; FIB MILLING; ION DOSE; NANO-GRATINGS; REDEPOSITION; SEM OBSERVATION; STRUCTURE FABRICATION;

ETCHING; IONS;

FOCUSED ION BEAMS;

EID: 70349972681     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/5/054003     Document Type: Article

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