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Volumn 54, Issue 23, 1996, Pages 16683-16695

Ion-beam processing of silicon at keV energies: A molecular-dynamics study

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Indexed keywords


EID: 2842549240     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.54.16683     Document Type: Article
Times cited : (234)

References (64)
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    • See, e.g., Handbook of Ion Implantation, edited by J.F. Ziegler (North-Holland, Amsterdam, 1992).
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  • 22
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    • P. Sigmund, Rev. Roum, Phys. 17, 823 (1972).
    • (1972) Phys. , vol.17 , pp. 823
    • Sigmund, P.1
  • 23
    • 0001499855 scopus 로고    scopus 로고
    • M. Jaraíz, G.H Gilmer, and T. Díaz de la Rubia, Appl. Phys. Lett. 68, 409 (1996).
    • (1996) Appl. Phys. Lett. , vol.68 , pp. 409
    • Jaraíz, M.1
  • 25
    • 0142182473 scopus 로고
    • T. Díaz de la Rubia and G.H. Gilmer, Phys. Rev. Lett. 74, 2507 (1995).
    • (1995) Phys. Rev. Lett. , vol.74 , pp. 2507
    • Gilmer, G.1
  • 45
    • 0001627582 scopus 로고
    • G. Bai and M.-A. Nicolet, J. Appl. Phys. 70, 649 (1991).
    • (1991) J. Appl. Phys. , vol.70 , pp. 649
    • Bai, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.