Effects of etch barrier densification on step and flash imprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2553-2556

  Johnson, S ^a   Burns, R ^a   Kim, E K ^a   Dickey, M ^a   Schmid, G ^a   Meiring, J ^a   Burns, S ^a   Willson, C G ^a   Convey, D ^b   Wei, Y ^b   Fejes, P ^b   Gehoski, K ^b   Mancini, D ^b   Nordquist, K ^b   Dauksher, W J ^b   Resnick, D J ^b  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSS SECTION IMAGES; ETCH BARRIERS; FLASH IMPRINTS; IMPRINT LITHOGRAPHY;

COMPUTER SIMULATION; ETCHING; FINITE ELEMENT METHOD; MATHEMATICAL MODELS; POLYMERIZATION; VOLUMETRIC ANALYSIS;

LITHOGRAPHY;

EID: 29044440010     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2102971     Document Type: Article

References (7)

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