Fabrication of microchannels in single-crystal GaN by wet-chemical-assisted femtosecond-laser ablation

Applied Surface Science

Volumn 255, Issue 24, 2009, Pages 9770-9774

  Nakashima, Seisuke ^a   Sugioka, Koji ^a   Midorikawa, Katsumi ^a  

^a RIKEN   (Japan)

Author keywords

Ablation; Femtosecond laser; Gallium nitride; Microchannel

Indexed keywords

ABLATION; CHLORINE COMPOUNDS; DEBRIS; ENERGY GAP; FABRICATION; FEMTOSECOND LASERS; GALLIUM NITRIDE; HYDROCHLORIC ACID; III-V SEMICONDUCTORS; LASER ABLATION; LASER CHEMISTRY; LASER PULSES; MICROCHANNELS; NITRIDES; OPTICAL WAVEGUIDES; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTOR LASERS; SINGLE CRYSTALS;

ABLATION DEBRIS; FEMTOSECOND (FS) LASER; FS-LASER DIRECT WRITINGS; GALLIUM NITRIDE (GAN); GAN SUBSTRATE; HIGH NUMERICAL APERTURES; PROCESSING METHOD; THRESHOLD FLUENCES;

WIDE BAND GAP SEMICONDUCTORS;

EID: 70349446484     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.04.159     Document Type: Article

References (13)

1. Smith S.A., Wolden C.A., Bremser M.D., Hanhser A.D., Davis R.F., and Lampert W.V. Appl. Phys. Lett. 71 (1997) 3631
2. Shul R.J., McClellan G.B., Casalnuovo S.A., Rieger D.J., Pearton S.J., Constantine C., Barratt C., Karlicek Jr. R.F., Tran C., and Schuman M. Appl. Phys. Lett. 69 (1996) 1119
3. Gillis H.P., Choutov D.A., Matin K.P., Pearton S.J., and Abernathy C.R. J. Electrochem. Soc. 143 (1996) L251
4. Lee H., Oberman D.B., and Harris Jr. J.S. Appl. Phys. Lett. 67 (1995) 1754
5. Fedison J.B., Chow T.P., Lu H., and Vhat I.B. J. Electrochem. Soc. 144 (1997) L221
6. Basak D., Verdu M., Montojo M.T., Sanchez-Garcia M.J., Sanchez F.J., Munoz E., and Calleja E. Semicond. Sci. Technol. 12 (1997) 1654
7. Akane T., Sugioka K., Ogino H., Takai H., and Midorikawa K. Appl. Surf. Sci. 148 (1999) 133
8. Akane T., Sugioka K., and Midorikawa K. Appl. Phys. A 69 (1999) S309
9. Akane T., Sugioka K., Nomura S., Hammura K., Aoki N., Toyoda K., Aoyagi Y., and Midorikawa K. Appl. Surf. Sci. 168 (2000) 335
10. Zhang J., Sugioka K., Wada S., Tashiro H., Toyoda K., and Midorikawa K. Appl. Surf. Sci. 127 (1998) 793
11. Akane T., Sugioka K., Hammura K., Aoyagi Y., Midorikawa K., Obata K., Toyoda K., and Nomura S. J. Vac. Sci. Technol. B 19 (2001) 1388
12. Obata K., Sugioka K., Midorikawa K., Inamura T., and Takai H. Appl. Phys. A 82 (2006) 479
13. Miura K., Qiu J., Inouye H., Mitsuyu T., and Hirao K. Appl. Phys. Lett. 71 (1997) 3329