Role of surfactants in adhesion reduction for step and flash imprint lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 7, Issue 3, 2008, Pages

  Lin, Michael W ^a   Hellebusch, Daniel J ^a   Wu, Kai ^a   Kim, Eui Kyoon ^a   Lu, Kuan H ^a   Liechti, Kenneth M ^a   Ekerdt, John G ^a   Ho, Paul S ^a   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

Author keywords

Adhesion; Imprint lithography; Release; SFIL; Surfactant

Indexed keywords

ADHESION; FRACTURE; FRACTURE ENERGY; PHOTOELECTRON SPECTROSCOPY; QUARTZ; SURFACE ACTIVE AGENTS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

ADHESIVE STRENGTH; ANGLE RESOLVED X RAY PHOTOELECTRON SPECTROSCOPY; FLUORINATED SURFACE; FLUORINATED SURFACTANT; FOUR-POINT BEND; IMPRINT LITHOGRAPHY; QUARTZ SURFACES; RELEASE; SFIL; STEP AND FLASH IMPRINT LITHOGRAPHY; SURFACTANT;

NANOIMPRINT LITHOGRAPHY;

EID: 80055031985     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2968269     Document Type: Article

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