메뉴 건너뛰기




Volumn 44, Issue 1-3, 1997, Pages 499-502

Gas-sensing applications of W-Ti-O-based nanosized thin films prepared by r.f. reactive sputtering

Author keywords

r.f. reactive sputtering; Thin films; WO3; NO2

Indexed keywords

ANNEALING; ELECTRON MICROSCOPY; IONS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; NITROGEN OXIDES; POLYCRYSTALLINE MATERIALS; SPUTTERING; THIN FILMS; TITANIUM; TUNGSTEN COMPOUNDS;

EID: 0031250695     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(97)00173-1     Document Type: Article
Times cited : (59)

References (8)
  • 1
  • 2
    • 0002156672 scopus 로고
    • S. Yamauchi (ed.), Kodansha and Elsevier, Singapore
    • N. Yamazoe, N. Miura, in S. Yamauchi (ed.), Chemical Sensor Technology, vol. 4, Kodansha and Elsevier, Singapore, 1992, pp. 19-24.
    • (1992) Chemical Sensor Technology , vol.4 , pp. 19-24
    • Yamazoe, N.1    Miura, N.2
  • 6
    • 0031094898 scopus 로고    scopus 로고
    • Microstructural characterization of a titanium-tungsten oxide gas sensor
    • M. Ferroni, V. Guidi, G. Martinelli, G. Sberveglieri, Microstructural characterization of a titanium-tungsten oxide gas sensor, J. Mater. Res. 12 (1997) 793-798.
    • (1997) J. Mater. Res. , vol.12 , pp. 793-798
    • Ferroni, M.1    Guidi, V.2    Martinelli, G.3    Sberveglieri, G.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.